Most of these facilities are centrally housed in the 275,600 square-foot Millennium Science Complex (MSC) at University Park where one wing of the building is dedicated to materials research. These facilities include the Nanofabrication Lab, Materials Computation Center, Materials Characterization Lab, and 2D Crystal Consortium – Materials Innovation Platform (2DCC). The 3DFeM team maintains the best and most complete set of facilities in the world for the deposition, characterization, and integration of ferroelectric materials. We have >8,000 sq. ft of thin film deposition facilities for oxide and chalcogenide ferroelectrics, including numerous sputter tools (SNL, Ihlefeld, Maria, Trolier-McKinstry), MBE (Engel-Herbert), laser ablation (Maria,Trolier-McKinstry), thermal and plasma-enhanced atomic layer deposition (Jackson, Ihlefeld,SNL, Trolier-McKinstry), chemical solution deposition (Ihlefeld, Trolier-McKinstry). Substrate sizes range from cm^2 to 8” wafers. These are supported by an extensive array of characterization tools, including 2 and 4 circle X-ray diffraction, atomic force microscopy, Raman spectroscopy (Beechem), electron microscopy (Alem), and electrical characterization toolsets.
3DFeM also has access to the University of Virginia Microfabrication Laboratory (UVML), housing optical and e-beam lithography tools, reactive ion etching instruments, and metal deposition tools SNL will bring to 3DFeM the capabilities of its MicroFab (uFab), a flexible facility dedicated to R&D efforts, with established processes for Hf,ZrOX, HfO2, ZrO2, SiO2, and Al2O3 among other oxides. The uFab has a production scale reactive sputtered deposition system for metals, AlN, and Al1-xScxN. The Sandia team also has expertise in etching Al1-xScxN films, as well as advanced fabrication integration capabilities to create rapid prototype structures for materials property testing.
Extensive computational facilities are available at all partner institutions, to support 3DFeM. The ORNL suite of advanced atomic force microscopes (AFM) enables mapping of electronic, magnetic, mechanical, electromechanical and electrochemical responses of a wide range of materials. The 3DFeM team leads the world in developing new capabilities for nanometer probing of ferroelectrics, including multifrequency (e.g. band excitation) imaging and spectroscopy developed to enable crosstalk-free and quantitative analysis of local material functionality.